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Journal description
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Details for article 15 of 39 found articles
| Title: |
Doping engineering to enhance the performance of double-gate pMOSFETs with ultrashort gate length (5 nm) |
| Author: |
Khaliq, Afshan Zhang, Shuo |
| Appeared in: |
Journal of computational electronics |
| Paging: | Volume 20 () nr. 3 pages 1178-1186 |
| Year: |
2021-05-06 |
| Contents: | |
| Publisher: |
Springer US, New York |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 15 of 39 found articles
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