INFLUENCE OF CURRENT DENSITY ON THE STRUCTURE OF AMORPHOUS SILICON SUBOXIDE THIN FILMS UNDER ELECTRON-BEAM ANNEALING
Titel:
INFLUENCE OF CURRENT DENSITY ON THE STRUCTURE OF AMORPHOUS SILICON SUBOXIDE THIN FILMS UNDER ELECTRON-BEAM ANNEALING
Auteur:
Baranov, E. A. Nepomnyashchikh, V. A. Konstantinov, V. O. Shchukin, V. G. Merkulova, I. E. Zamchiy, A. O. Lunev, N. A. Volodin, V. A. Shapovalova, A. A.
Verschenen in:
Journal of applied mechanics and technical physics