Plasma-chemical synthesis of silicon carbonitride films from trimethyl(diethylamino)silane
Titel:
Plasma-chemical synthesis of silicon carbonitride films from trimethyl(diethylamino)silane
Auteur:
Kosinova, M. L. Rumyantsev, Yu. M. Chernyavskii, L. I. Nikulina, L. D. Kesler, V. G. Maximovskii, E. A. Fainer, N. I. Rakhlin, V. I. Voronkov, M. G. Kuznetsov, F. A.