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                                       Details for article 3 of 10 found articles
 
 
  Development of Polishing Materials Based on Nonwoven Matrices and Polyesterurethane Solutions for Chemical Mechanical Planarization of Dielectric Layers of Semiconductor Wafers
 
 
Title: Development of Polishing Materials Based on Nonwoven Matrices and Polyesterurethane Solutions for Chemical Mechanical Planarization of Dielectric Layers of Semiconductor Wafers
Author: Bokova, E. S.
Terashkevich, D. I.
Plotnikov, D. S.
Kovalenko, G. M.
Appeared in: Fibre chemistry
Paging: Volume 56 () nr. 6 pages 396-400
Year: 2025-07-11
Contents:
Publisher: Springer US, New York
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 3 of 10 found articles
 
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