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Journal description
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Details for article 2 of 5 found articles
| Title: |
New polyphenols of the fluorene family and positive-tone photoresists based on them for 22-nm nanolithography |
| Author: |
Vainer, A. Ya. Dyumaev, K. M. Kovalenko, A. M. Davidovich, M. Z. Zelikson, K. I. Pinchuk, E. M. |
| Appeared in: |
Doklady chemistry |
| Paging: | Volume 442 (2012) nr. 1 pages 7-11 |
| Year: |
2012 |
| Contents: | |
| Publisher: |
SP MAIK Nauka/Interperiodica, Dordrecht |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 2 of 5 found articles
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