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  Chemical vapor deposition of gold on \mathrm{Al}_{2}\mathrm{O}_{3}, \mathrm{SiO}_{2}, and \mathrm{TiO}_{2} for the oxidation of CO and of \mathrm{H}_{2}
 
 
Title: Chemical vapor deposition of gold on \mathrm{Al}_{2}\mathrm{O}_{3}, \mathrm{SiO}_{2}, and \mathrm{TiO}_{2} for the oxidation of CO and of \mathrm{H}_{2}
Author: Mitsutaka Okumura
Shyunichi Nakamura
Susumu Tsubota
Toshiko Nakamura
Masashi Azuma
Masatake Haruta
Appeared in: Catalysis letters
Paging: Volume 51 (1998) nr. 1 pages 6 p.
Year: 1998
Contents:
Publisher: Kluwer Academic Publishers, Dordrecht, The Netherlands
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

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 Koninklijke Bibliotheek - National Library of the Netherlands