Charge trapping in SiO2 substrate during electron beam deposition of CaF2 thin films of different thicknesses
Titel:
Charge trapping in SiO2 substrate during electron beam deposition of CaF2 thin films of different thicknesses
Auteur:
Romanova, Marina Chertopalov, Sergii Dekhtyar, Yuri Fekete, Ladislav Lančok, Ján Novotný, Michal Pokorný, Petr Popov, Anatoli I. Sorokins, Hermanis Vilken, Aleksandr