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A Transparent Photoresist Made of Titanium Dioxide Nanoparticle-Embedded Acrylic Resin with a Tunable Refractive Index for UV-Imprint Lithography |
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Titel: |
A Transparent Photoresist Made of Titanium Dioxide Nanoparticle-Embedded Acrylic Resin with a Tunable Refractive Index for UV-Imprint Lithography |
Auteur: |
Liu, Yinglu Wang, Dan Liu, Changlin Hao, Qianqian Li, Jian Wang, Jie-Xin Chen, Xiuyun Zhong, Peng Shao, Xibin Chen, Jian-Feng |
Verschenen in: |
Engineering |
Paginering: |
Jaargang 37 () nr. C pagina's 96-104 |
Jaar: |
2024 |
Inhoud: |
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Uitgever: |
Chinese Academy of Engineering |
Bronbestand: |
Elektronische Wetenschappelijke Tijdschriften |
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