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                                       Details for article 4 of 54 found articles
 
 
  Area-selective atomic layer deposition of Al2O3 thin films for metal versus dielectric selectivity using vapor-dosed alkanethiols
 
 
Title: Area-selective atomic layer deposition of Al2O3 thin films for metal versus dielectric selectivity using vapor-dosed alkanethiols
Author: Lee, Jinseon
Oh, Jiwoo
Lee, Jeongbin
Lee, Jeong-Min
Kim, Hyun Gu
Cho, Byungchul
Kim, Min Su
Kim, Woo-Hee
Appeared in: Surfaces and interfaces
Paging: Volume 67 () nr. C pages p.
Year: 2025
Contents:
Publisher: Elsevier B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 4 of 54 found articles
 
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