Tuning the crystallization temperature of titanium dioxide thin films by incorporating silicon dioxide via supercycle atomic layer deposition
Titel:
Tuning the crystallization temperature of titanium dioxide thin films by incorporating silicon dioxide via supercycle atomic layer deposition
Auteur:
Hedrich, Carina Deduytsche, Davy Petit, Robin R. Krekeler, Tobias Peng, Jun Ritter, Martin Dendooven, Jolien Detavernier, Christophe Blick, Robert H. Zierold, Robert