Effect of 2-phosphonobutane-1,2,4-tricarboxylic acid (PBTCA) on Cu/Ta chemical mechanical planarization (CMP) in the barrier layer: A novel complexing agent and the dual role on Cu
Titel:
Effect of 2-phosphonobutane-1,2,4-tricarboxylic acid (PBTCA) on Cu/Ta chemical mechanical planarization (CMP) in the barrier layer: A novel complexing agent and the dual role on Cu
Auteur:
Meng, Ni Zhang, Xianglong Xie, Shunfan Li, Xianghui Nie, Shenao Qiu, Yuxuan Wei, Ying Li, Junfeng Meng, Ruhao He, Yangang