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Details for article 19 of 209 found articles
| Title: |
Atomic layer deposition mechanism of hafnium dioxide using hafnium precursor with amino ligands and water |
| Author: |
Li, Jing Guo, Jiayi Zhou, Zhongchao Xu, Rui Xu, Lina Ding, Yihong Xiao, Hongping Li, Xinhua Li, Aidong Fang, Guoyong |
| Appeared in: |
Surfaces and interfaces |
| Paging: | Volume 44 () nr. C pages p. |
| Year: |
2024 |
| Contents: | |
| Publisher: |
Published by Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 19 of 209 found articles
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