Digital Library
Close Browse articles from a journal
 
<< previous    next >>
     Journal description
       All volumes of the corresponding journal
         All issues of the corresponding volume
           All articles of the corresponding issues
                                       Details for article 104 of 148 found articles
 
 
  Reactions between SiCl4 and H2O on rutile TiO2 surfaces in atomic layer deposition of SiO2 by first-principles calculations
 
 
Title: Reactions between SiCl4 and H2O on rutile TiO2 surfaces in atomic layer deposition of SiO2 by first-principles calculations
Author: Ta, Huong T.T.
Bui, Hao V.
Nguyen, Viet-Huong
Tieu, A. Kiet
Appeared in: Surfaces and interfaces
Paging: Volume 36 () nr. C pages p.
Year: 2023
Contents:
Publisher: Elsevier B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 104 of 148 found articles
 
<< previous    next >>
 
 Koninklijke Bibliotheek - National Library of the Netherlands