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Low temperature silicon nitride grown by very high frequency (VHF, 162MHz) plasma enhanced atomic layer deposition with floating multi-tile electrode |
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Titel: |
Low temperature silicon nitride grown by very high frequency (VHF, 162MHz) plasma enhanced atomic layer deposition with floating multi-tile electrode |
Auteur: |
Ji, You Jin Kim, Hae In Kim, Ki Hyun Kang, Ji Eun Kim, Doo San Kim, Ki Seok Ellingboe, A.R. Kim, Dong Woo Yeom, Geun Young |
Verschenen in: |
Surfaces and interfaces |
Paginering: |
Jaargang 33 () nr. C pagina's p. |
Jaar: |
2022 |
Inhoud: |
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Uitgever: |
Published by Elsevier B.V. |
Bronbestand: |
Elektronische Wetenschappelijke Tijdschriften |
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