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                                       Details for article 65 of 109 found articles
 
 
  Low temperature silicon nitride grown by very high frequency (VHF, 162MHz) plasma enhanced atomic layer deposition with floating multi-tile electrode
 
 
Title: Low temperature silicon nitride grown by very high frequency (VHF, 162MHz) plasma enhanced atomic layer deposition with floating multi-tile electrode
Author: Ji, You Jin
Kim, Hae In
Kim, Ki Hyun
Kang, Ji Eun
Kim, Doo San
Kim, Ki Seok
Ellingboe, A.R.
Kim, Dong Woo
Yeom, Geun Young
Appeared in: Surfaces and interfaces
Paging: Volume 33 () nr. C pages p.
Year: 2022
Contents:
Publisher: Published by Elsevier B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 65 of 109 found articles
 
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