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Details for article 103 of 130 found articles
| Title: |
Silicon Dioxide Deposited Using Atmospheric Pressure Plasma Chemical Vapor Deposition for Improved Adhesion and Water Intrusion Resistance for Lightweight Manufacturing |
| Author: |
Jeckell, Zachary Patel, Dhruval Herschberg, Andrew Choi, Tag Barlaz, David Bonova, Lucia Shchelkanov, Ivan Jurczyk, Brian Ruzic, David |
| Appeared in: |
Surfaces and interfaces |
| Paging: | Volume 23 () nr. C pages p. |
| Year: |
2021 |
| Contents: | |
| Publisher: |
Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 103 of 130 found articles
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