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                                       Details for article 14 of 42 found articles
 
 
  Effect of ALD window on thermal ALD deposited HfOx/Si interface for silicon surface passivation
 
 
Title: Effect of ALD window on thermal ALD deposited HfOx/Si interface for silicon surface passivation
Author: Tomer, Shweta
Panigrahi, Jagannath
Pathi, Prathap
Gupta, Govind
Vandana,
Appeared in: Materials today: proceedings
Paging: Volume 46 () nr. P12 pages 5761-5765
Year: 2021
Contents:
Publisher: Published by Elsevier B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 14 of 42 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands