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Details for article 17 of 48 found articles
| Title: |
Influence of O2 flow rate on the characteristics of TiO2 thin films deposited by RF reactive sputtering |
| Author: |
Kamble, Sudhir S. Radhakrishnan, J.K. |
| Appeared in: |
Materials today: proceedings |
| Paging: | Volume 45 () nr. P4 pages 3915-3919 |
| Year: |
2021 |
| Contents: | |
| Publisher: |
Published by Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 17 of 48 found articles
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