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                                       Details for article 9 of 12 found articles
 
 
  Plasma deposited silicon oxide films for controlled permeation of copper as antimicrobial agent
 
 
Title: Plasma deposited silicon oxide films for controlled permeation of copper as antimicrobial agent
Author: Lehmann, Antje
Rupf, Stefan
Schubert, Andreas
Zylla, Isabella-Maria
Seifert, Hans Jürgen
Schindler, Axel
Arnold, Thomas
Appeared in: Clinical plasma medicine
Paging: Volume 3 (2015) nr. 1 pages 7 p.
Year: 2015
Contents:
Publisher: Elsevier GmbH
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 9 of 12 found articles
 
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