|
| << previous | next >> |
Journal description
All volumes of the corresponding journal
All issues of the corresponding volume
All articles of the corresponding issues
Details for article 107 of 216 found articles
| Title: |
Kinetics of growth of thin-films of Co2Si, Ni2Si, WSi2 and VSi2 during a reactive diffusion process |
| Author: |
Akintunde, S.O. Selyshchev, P.A. |
| Appeared in: |
Results in physics |
| Paging: | Volume 6 (2016) nr. C pages 43-47 |
| Year: |
2016 |
| Contents: | |
| Publisher: |
The Authors |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 107 of 216 found articles
| << previous | next >> |