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Journal description
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Details for article 36 of 68 found articles
| Title: |
Machine-learning-enabled geometric compliance improvement in two-photon lithography without hardware modifications |
| Author: |
Yang, Yuhang Kelkar, Varun A. Rajput, Hemangg S. Salazar Coariti, Adriana C. Toussaint Jr, Kimani C. Shao, Chenhui |
| Appeared in: |
Journal of manufacturing processes |
| Paging: | Volume 76 () nr. C pages 841-849 |
| Year: |
2022 |
| Contents: | |
| Publisher: |
The Society of Manufacturing Engineers |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 36 of 68 found articles
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