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Journal description
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Details for article 88 of 140 found articles
| Title: |
Plasma State of Pulse Reactive Magnetron Sputtering ZnO: Al Thin Films |
| Author: |
Li, L.N. Zhao, Y. Chen, X.L. Huang, Q. Wang, Y.F. Zhang, X.D. |
| Appeared in: |
Physics procedia |
| Paging: | Volume 32 (2012) nr. C pages 7 p. |
| Year: |
2012 |
| Contents: | |
| Publisher: |
Published by Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 88 of 140 found articles
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