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Journal description
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Details for article 51 of 82 found articles
| Title: |
Material removal function of the capacitive coupled hollow cathode plasma source for plasma polishing |
| Author: |
Wang, Dasen Liu, Weiguo Wu, Yilong Hang, Lingxia Yu, Huadong Jin, Na |
| Appeared in: |
Physics procedia |
| Paging: | Volume 19 (2011) nr. C pages 4 p. |
| Year: |
2011 |
| Contents: | |
| Publisher: |
Published by Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 51 of 82 found articles
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