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                                       Details for article 39 of 51 found articles
 
 
  Redeposition mechanism on silicon oxide layers during selective etching process in 3D NAND manufacture
 
 
Title: Redeposition mechanism on silicon oxide layers during selective etching process in 3D NAND manufacture
Author: Zhou, Zihan
Wu, Yunwen
Ling, Huiqin
Guo, Jie
Wang, Su
Li, Ming
Appeared in: Journal of industrial and engineering chemistry
Paging: Volume 119 () nr. C pages 218-225
Year: 2023
Contents:
Publisher: The Korean Society of Industrial and Engineering Chemistry
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 39 of 51 found articles
 
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