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Robust ferroelectric and low coercive field in ZrO2 thin film through wide chemical-processing window |
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Titel: |
Robust ferroelectric and low coercive field in ZrO2 thin film through wide chemical-processing window |
Auteur: |
Liu, Xiuqiao Li, Hangren Zheng, Dongxing Tu, Jie Xi, Guoqiang Liu, Xudong Wu, Rong Lu, Dongfei Wang, Qingxiao Zhang, Xixiang Tian, Jianjun Zhang, Linxing |
Verschenen in: |
Nano today |
Paginering: |
Jaargang 59 () nr. C pagina's p. |
Jaar: |
2024 |
Inhoud: |
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Uitgever: |
Published by Elsevier B.V. |
Bronbestand: |
Elektronische Wetenschappelijke Tijdschriften |
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