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                                       Details for article 86 of 178 found articles
 
 
  Investigation of the formation mechanism of the fluorocarbon film in CF4 plasma processing of fused silica
 
 
Title: Investigation of the formation mechanism of the fluorocarbon film in CF4 plasma processing of fused silica
Author: Jin, Huiliang
Fan, Fei
Yuan, Zhigang
Li, Yaguo
Appeared in: Optik
Paging: Volume 202 () nr. C pages p.
Year: 2020
Contents:
Publisher: Published by Elsevier B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 86 of 178 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands