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Journal description
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Details for article 35 of 128 found articles
| Title: |
Effect of deposition rate on the growth mechanism of microcrystalline silicon thin films using very high frequency PECVD |
| Author: |
Li, Xinli Jin, Ruimin Li, Lihua Lu, Jingxiao Gu, Yongjun Ren, Fengzhang Huang, Jinliang |
| Appeared in: |
Optik |
| Paging: | Volume 180 (2019) nr. C pages 104-112 |
| Year: |
2019 |
| Contents: | |
| Publisher: |
Elsevier GmbH |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 35 of 128 found articles
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