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                                       Details for article 35 of 128 found articles
 
 
  Effect of deposition rate on the growth mechanism of microcrystalline silicon thin films using very high frequency PECVD
 
 
Title: Effect of deposition rate on the growth mechanism of microcrystalline silicon thin films using very high frequency PECVD
Author: Li, Xinli
Jin, Ruimin
Li, Lihua
Lu, Jingxiao
Gu, Yongjun
Ren, Fengzhang
Huang, Jinliang
Appeared in: Optik
Paging: Volume 180 (2019) nr. C pages 104-112
Year: 2019
Contents:
Publisher: Elsevier GmbH
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 35 of 128 found articles
 
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