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Journal description
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Details for article 76 of 98 found articles
| Title: |
Research on critical dimensions variation based on improved optical lithography imaging model |
| Author: |
Li, Yang Li, Yanfang Li, Ying Li, Qun Jiang, Bifen |
| Appeared in: |
Optik |
| Paging: | Volume 174 () nr. C pages 289-295 |
| Year: |
2018 |
| Contents: | |
| Publisher: |
Elsevier GmbH |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 76 of 98 found articles
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