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                                       Details for article 2 of 19 found articles
 
 
  A novel integrated method realizing iteratively optimized modeling for proximity field patterning nanolithography
 
 
Title: A novel integrated method realizing iteratively optimized modeling for proximity field patterning nanolithography
Author: Su, M.F.
El-Kady, I.
Reda Taha, M.M.
Christodoulou, C.G.
Appeared in: Photonics and nanostructures
Paging: Volume 6 (2008) nr. 1 pages 12 p.
Year: 2008
Contents:
Publisher: Elsevier B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 2 of 19 found articles
 
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