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| Titel: |
The Modified Chemical Vapor Deposition Process in a Concentric Annulus: An Extension for Focused High-Rate Deposition |
| Auteur: |
Fiebig, M. Hilgenstock, M. Riemann, H.-A. |
| Verschenen in: |
Aerosol science and technology |
| Paginering: | Jaargang 9 (1988) nr. 3 pagina's 237-249 |
| Jaar: |
1988 |
| Inhoud: |
A considerable percentage of the increasing production of glass fibers for telecommunication is based on the modified chemical vapor deposition (MCVD) process. The efficiency of this process is strongly hampered by the restricted and incomplete deposition of the expensive basic materials and the large taper effect. The introduction of an annular MCVD process yields not only complete and focused deposition but also an increased production rate. To investigate the conditions for optimal performance, the governing partial differential equations were solved. By identifying the characteristic parameters and their influence on the process, optimal design conditions were found for specific combinations of those parameters. |
| Uitgever: |
Taylor & Francis |
| Bronbestand: |
Elektronische Wetenschappelijke Tijdschriften |
Details van artikel 8 van 10 gevonden artikelen
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