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| Titel: |
An Analysis of Aerosol Dynamics in the Modified Chemical Vapor Deposition |
| Auteur: |
Park, K. S. Lee, B. W. Choi, M. |
| Verschenen in: |
Aerosol science and technology |
| Paginering: | Jaargang 31 (1999) nr. 4 pagina's 258-274 |
| Jaar: |
1999-10-01 |
| Inhoud: |
A numerical study of aerosol dynamics has been done to obtain axially and radially varying size distributions of particles generated during the Modified Chemical Vapor Deposition process. Heat and mass transfer have also been studied since the generation and deposition of particles strongly depend on the temperature field in a tube. Bimodal size distributions have been obtained both in a particulate flow and in the deposited layer using the sectional method to solve aerosol dynamics. Results obtained by the moment method and the sectional method have also been compared to each other. Variations of geometric mean diameter and geometric standard deviation have been investigated for various flow rates. The comparison between one-dimensional and two-dimensional sectional approaches has also been made. One-dimensional analysis can be reasonably used for small flow rates; however, for large flow rates, one- and two-dimensional analyses give very different results. |
| Uitgever: |
Taylor & Francis |
| Bronbestand: |
Elektronische Wetenschappelijke Tijdschriften |
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