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Details van artikel 2 van 5 gevonden artikelen
| Titel: |
Behavior of Small Particles from Process Gas Streams in Diffusion Furnaces |
| Auteur: |
Lee, K. W. Curtis, L. A. Chahine, J. J. Yaghmaie, F. |
| Verschenen in: |
Aerosol science and technology |
| Paginering: | Jaargang 16 (1992) nr. 4 pagina's 236-245 |
| Jaar: |
1992 |
| Inhoud: |
The deposition of small particles in the diffusion furnace environment was examined. A 6-ft-long and 6 1/4-in diameter quartz tube furnace was used. Particles ranging from 0.5 to 10 μm in diameter were generated and the deposition rate onto 5-in wafers in the furnace was measured as a function of gas stream flow rate, furnace temperature, and pressure. The measured deposition velocity ranged from 5×10-5 to 5×10-3 cm/s. The results of this study indicate that the deposition of particles decreases with increasing furnace tern perature. In addition, deposition increases as the wafer spacing increases and decreases as the wafers are placed further away from the entrance. Particles are found to deposit preferentially on the outer portion of the wafers. Owing to the flow pattern in the diffusion furnace, deposition of particulates is higher at the top of the wafer. The electrostatic charge effects were found to be insignificant. |
| Uitgever: |
Taylor & Francis |
| Bronbestand: |
Elektronische Wetenschappelijke Tijdschriften |
Details van artikel 2 van 5 gevonden artikelen
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