|
Ultra-Shallow Doping B, Mg, Ni, Cu, Mn, Cr and Fe into SiC with Very High Surface Concentrations Based on Plasma Stimulated Room-Temperature Diffusion |
|
|
|
Titel: |
Ultra-Shallow Doping B, Mg, Ni, Cu, Mn, Cr and Fe into SiC with Very High Surface Concentrations Based on Plasma Stimulated Room-Temperature Diffusion |
Auteur: |
Hou, Ruixiang Li, Lei Fang, Xin Zhao, Hui Chen, Yihang Xie, Ziang Sun, Guosheng Zhang, Xinhe Zhao, Yanfei Huang, Rong Huang, Zengli He, Youqin Ma, Nongnong Zhang, Jicai Xu, Wanjing Yang, Jinbo Xiao, Chijie Qin, G. G. |
Verschenen in: |
Journal of materials engineering and performance |
Paginering: |
Jaargang 28 (2018) nr. 1 pagina's 162-168 |
Jaar: |
2018 |
Inhoud: |
|
Uitgever: |
Springer US, New York |
Bronbestand: |
Elektronische Wetenschappelijke Tijdschriften |
|
|
|
|