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Journal description
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Details for article 55 of 87 found articles
| Title: |
Low temperature annealing of B and P ions incorporated into deposited- and self-implanted amorphous Si |
| Author: |
Ishiwara, Hiroshi Naruke, Kiyomi Furukawa, Seijiro |
| Appeared in: |
Nuclear instruments and methods in physics research |
| Paging: | Volume 209-210 (1983) nr. P2 pages 5 p. |
| Year: |
1983 |
| Contents: | |
| Publisher: |
Published by Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 55 of 87 found articles
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