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Sensitization of track etching in CR-39 by copolymerization with methacryloyl-L-alanine methyl ester |
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Titel: |
Sensitization of track etching in CR-39 by copolymerization with methacryloyl-L-alanine methyl ester |
Auteur: |
Tamada, Masao Yoshida, Masaru Asano, Masaharu Omichi, Hideki Katakal, Ryoichi Trautmann, Christine Vetter, Johann Shohr, Reimar |
Verschenen in: |
International journal of radiation, applications and instrumentation. Part D, Nuclear tracks and radiation measurements |
Paginering: |
Jaargang 20 (1992) nr. 4 pagina's 5 p. |
Jaar: |
1992 |
Inhoud: |
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Uitgever: |
Published by Elsevier B.V. |
Bronbestand: |
Elektronische Wetenschappelijke Tijdschriften |
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