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                                       Details for article 7 of 58 found articles
 
 
  Deposition and Characterization of 3-Aminopropyltrimethoxysilane Monolayer Diffusion Barrier for Copper Metallization
 
 
Title: Deposition and Characterization of 3-Aminopropyltrimethoxysilane Monolayer Diffusion Barrier for Copper Metallization
Author: Sharma, Sumit
Kumar, Mukesh
Rani, Sumita
Kumar, Dinesh
Appeared in: Metallurgical and materials transactions. B, Process metallurgy and materials processing science
Paging: Volume 46 (2014) nr. 2 pages 928-932
Year: 2014
Contents:
Publisher: Springer US, Boston
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 7 of 58 found articles
 
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