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                                       Details for article 10 of 60 found articles
 
 
  Dislocation Density Reduction in MOVPE-Grown (211) CdTe/Si by Post-Growth Patterning and Annealing
 
 
Title: Dislocation Density Reduction in MOVPE-Grown (211) CdTe/Si by Post-Growth Patterning and Annealing
Author: Chaudhari, B. S.
Niraula, M.
Takagi, Y.
Okumura, R.
Sharma, K. P.
Maruyama, T.
Appeared in: Journal of electronic materials
Paging: Volume 52 () nr. 5 pages 3431-3435
Year: 2023-03-09
Contents:
Publisher: Springer US, New York
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 10 of 60 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands