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Journal description
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Details for article 55 of 70 found articles
| Title: |
Stress-Induced Variability Studies in Tri-Gate FinFETs with Source/Drain Stressor at 7 nm Technology Nodes |
| Author: |
Dash, T. P. Jena, J. Mohapatra, E. Dey, S. Das, S. Maiti, C. K. |
| Appeared in: |
Journal of electronic materials |
| Paging: | Volume 48 (2019) nr. 8 pages 5348-5362 |
| Year: |
2019 |
| Contents: | |
| Publisher: |
Springer US, New York |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 55 of 70 found articles
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