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Journal description
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Details for article 79 of 105 found articles
| Title: |
Role of Hydrogen Flow Rate on Microstructure of a-Si:H(n) Films: Spectroscopic Ellipsometry Studies |
| Author: |
Kanneboina, Venkanna Agarwal, Pratima |
| Appeared in: |
Journal of electronic materials |
| Paging: | Volume 48 (2019) nr. 4 pages 2404-2410 |
| Year: |
2019 |
| Contents: | |
| Publisher: |
Springer US, New York |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 79 of 105 found articles
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