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Journal description
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Details for article 45 of 90 found articles
| Title: |
Influence of Design and Process Parameters of 32-nm Advanced-Process High-kp-MOSFETs on Negative-Bias Temperature Instability and Study of Defects |
| Author: |
Alimin, A. F. Muhammad Radzi, A. A. Mohd Sazali, N. A. F. Hatta, S. F. Wan Muhamad Soin, N. Hussin, H. |
| Appeared in: |
Journal of electronic materials |
| Paging: | Volume 46 (2017) nr. 10 pages 5942-5949 |
| Year: |
2017 |
| Contents: | |
| Publisher: |
Springer US, New York |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 45 of 90 found articles
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