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Journal description
All volumes of the corresponding journal
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Details for article 9 of 27 found articles
| Title: |
Fifteen-Nanometer Ru Diffusion Barrier on NiSi/Si for a sub-45 nm Cu Contact Plug |
| Author: |
Lin, Jia-Huei Lee, Jiing-Herng Hsu, Chen-Sheng Fang, Jau-Shiung |
| Appeared in: |
Journal of electronic materials |
| Paging: | Volume 38 (2009) nr. 11 pages 2251-2256 |
| Year: |
2009 |
| Contents: | |
| Publisher: |
Springer US, Boston |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 9 of 27 found articles
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