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Journal description
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Details for article 7 of 18 found articles
| Title: |
New plasma chemistries for etching III–V compound semiconductors: Bl3 and BBr3 |
| Author: |
Maeda, Takeshi Cho, Hyun Hong, Jin Pearton, S. J. |
| Appeared in: |
Journal of electronic materials |
| Paging: | Volume 28 () nr. 2 pages 118-123 |
| Year: |
1999-04-03 |
| Contents: | |
| Publisher: |
Springer-Verlag, New York |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 7 of 18 found articles
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