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                                       Details for article 34 of 40 found articles
 
 
  Si-implantation activation annealing of GaN up to 1400°C
 
 
Title: Si-implantation activation annealing of GaN up to 1400°C
Author: Zolper, J. C.
Han, J.
Biefeld, R. M.
Deusen, S. B. van
Wampler, W. R.
Reiger, D. J.
Pearton, S. J.
Williams, J. S.
Tan, H. H.
Karlicek, R. F.
Stall, R. A.
Appeared in: Journal of electronic materials
Paging: Volume 27 (1998) nr. 4 pages 179-184
Year: 1998
Contents:
Publisher: Springer-Verlag, New York
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 34 of 40 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands