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Journal description
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Details for article 19 of 67 found articles
| Title: |
Effect of hydrogen pressure on the deposition of amorphous silicon films by tetrode RF sputtering |
| Author: |
Gekka, Yasuo Asai, Hiroshi Temma, Tsuyoshi Yasumura, Yoh-ichi |
| Appeared in: |
Applications of surface science |
| Paging: | Volume 22-23 (1985) nr. P2 pages 9 p. |
| Year: |
1985 |
| Contents: | |
| Publisher: |
Published by Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 19 of 67 found articles
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