|
| << previous | next >> |
Journal description
All volumes of the corresponding journal
All issues of the corresponding volume
All articles of the corresponding issues
Details for article 6 of 10 found articles
| Title: |
Infrared-laser induced production of silicon coating via reaction of silane with trifluoroacetic acid |
| Author: |
Pola, J. Bastl, Z. Tláskal, J. |
| Appeared in: |
Infrared physics |
| Paging: | Volume 30 (1990) nr. 4 pages 3 p. |
| Year: |
1990 |
| Contents: | |
| Publisher: |
Published by Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 6 of 10 found articles
| << previous | next >> |