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Journal description
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Details for article 5 of 15 found articles
| Title: |
Determination of the etch rate of silicon in buffered HF using a 31Si tracer method |
| Author: |
Hoffmeister, W. Zügel, M. |
| Appeared in: |
The international journal of applied radiation and isotopes |
| Paging: | Volume 20 (1969) nr. 2 pages 2 p. |
| Year: |
1969 |
| Contents: | |
| Publisher: |
Published by Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 5 of 15 found articles
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