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Journal description
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Details for article 59 of 83 found articles
| Title: |
Plasma immersion nitrogen implantation into silicon and rapid thermal electron beam annealing for surface structuring |
| Author: |
Markwitz, A Kennedy, V.J Short, K Rudolphi, M Baumann, H |
| Appeared in: |
Current applied physics |
| Paging: | Volume 4 (2004) nr. 2-4 pages 4 p. |
| Year: |
2004 |
| Contents: | |
| Publisher: |
Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 59 of 83 found articles
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