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Journal description
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Details for article 3 of 17 found articles
| Title: |
Drastic improvement of as-sputtered silicon nitride thin film quality at room temperature by ArF excimer-laser annealing method |
| Author: |
Choi, D.H. Kim, H.S. Oh, S.Y. Lee, C.H. |
| Appeared in: |
Current applied physics |
| Paging: | Volume 16 (2016) nr. 8 pages 10 p. |
| Year: |
2016 |
| Contents: | |
| Publisher: |
Published by Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 3 of 17 found articles
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