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                                       Details for article 12 of 20 found articles
 
 
  High mobility, bottom gate, nanocrystalline silicon thin film transistors incorporating a nitrogenated incubation layer
 
 
Title: High mobility, bottom gate, nanocrystalline silicon thin film transistors incorporating a nitrogenated incubation layer
Author: Bu, I.Y.Y.
Flewitt, A.J.
Milne, W.I.
Appeared in: Current applied physics
Paging: Volume 11 (2011) nr. 2 pages 5 p.
Year: 2011
Contents:
Publisher: Elsevier B.V.
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 12 of 20 found articles
 
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