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Journal description
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Details for article 37 of 83 found articles
| Title: |
Hydrogenated amorphous silicon film as intrinsic passivation layer deposited at various temperatures using RF remote-PECVD technique |
| Author: |
Jeon, Minsung Yoshiba, Shuhei Kamisako, Koichi |
| Appeared in: |
Current applied physics |
| Paging: | Volume 10 (2010) nr. 2S pages 4 p. |
| Year: |
2010 |
| Contents: | |
| Publisher: |
Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 37 of 83 found articles
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