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Journal description
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Details for article 11 of 66 found articles
| Title: |
Characteristics of nitrogen-incorporated silicon oxycarbide films and plasmas for plasma enhanced chemical vapor deposition with TMOS/N2/NH3 |
| Author: |
Chung, C.J. Chung, T.H. Shin, Y.M. Kim, Y. |
| Appeared in: |
Current applied physics |
| Paging: | Volume 10 (2010) nr. 2 pages 8 p. |
| Year: |
2010 |
| Contents: | |
| Publisher: |
Elsevier B.V. |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 11 of 66 found articles
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